Statistics
Publications
2
Citations
79
H-Index
2
Active since
2020
Affiliations
Tokyo Institute of Technology(Current)
Le Dong is an author at Tokyo Institute of Technology specializing in engineering, electrical engineering, and defect tolerance.
Publications per year
2020–2024
2
2
Hydrogen-Defect Termination in SnO for p-Channel TFTs
Alex Lee, Le Dong, Kosuke Matsuzaki et al. · ACS Applied Electronic Materials · 2020 · 51 citations
Semiconductor Technology, Oxygen Vacancy, Electrical Engineering +13
1–2 of 2