J. Selvakumar

Vapor Pressure Measurements of Sc(tmhd)₃ and Synthesis of Stabilized Zirconia Thin Films by Hybrid CVD Technique Using Sc(tmhd)₃, Zr(tmhd)₄, and Al(acac)₃ [tmhd, 2,2,6,6-tetramethyl-3,5-heptanedione; acac, 2,4-pentanedione] as Precursors

J. Selvakumar, V.S. Raghunathan, K.S. Nagaraja · The Journal of Physical Chemistry C · 2009 · 31 citations

Engineering, Solid-state Chemistry, Thin Film Process Technology +16

Determination of reaction kinetics during vitrification of radioactive liquid waste for different types of base glass

G. Suneel, J. Selvakumar, C.P. Kaushik et al. · Nuclear Engineering and Technology · 2018 · 24 citations · Full text

Tris(2,4‐pentanedionato)scandium(III) as a Precursor for Plasma‐Assisted Liquid Injection CVD to Deposit Nanocrystalline Scandia Thin Films

J. Selvakumar, V.S. Raghunathan, K.S. Nagaraja · Chemical Vapor Deposition · 2009 · 13 citations

Materials Science, Dominant Orientation, Engineering +14

Simulated studies on optimization and characterization of feed and product of melter for safe disposal of high-level radioactive liquid waste

J. Selvakumar, S. Chitra, Biplob Paul · Progress in Nuclear Energy · 2019 · 13 citations

Chemical Engineering, Simulated Studies, Nuclear Waste Management +8

Role of thermal stability and vapor pressure of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium(II) and its triamine adduct in producing magnesium oxide thin film using a plasma-assisted LICVD process

Mathew Maria, J. Selvakumar, V.S. Raghunathan et al. · Surface and Coatings Technology · 2009 · 12 citations

Materials Science, Chemical Engineering, Engineering +6