Concepedia

Hsiao‐Yi Shih

HS

Statistics

Publications

5

Citations

121

H-Index

5

Active since

1994

Affiliations

Polaroid (United States)(Current)

Hsiao‐Yi Shih is an author at Polaroid (United States) specializing in chemical kinetics, engineering, and chemistry.

Top concepts

ChemistryEngineeringChemical KineticsBiophysicsMedicinePharmacologyDrug DiscoveryPhotochemistryTechnologyToxicology

Publications per year

1994–1997

5

Publications

5

Novolak‐Diazoquinone Resists: The Imaging Systems of the Computer Chip

Arnost Reiser, Hsiao‐Yi Shih, Tung‐Feng Yeh et al. · Angewandte Chemie International Edition in English · 1996 · 56 citations

Optical Materials, Engineering, Optoelectronic Devices +21

A Percolation View of Novolak Dissolution. 4. Mechanism of Inhibitor Action

Hsiao‐Yi Shih, Arnost Reiser · Macromolecules · 1995 · 21 citations

Altmetrics, Molecular Pharmacology, Percolation View +14

A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition

Hsiao‐Yi Shih, Tung‐Feng Yeh, Arnost Reiser et al. · Macromolecules · 1994 · 17 citations

Pharmaceutical Science, Percolation View, Engineering +15

Percolation View of Novolak Dissolution. 5. The Dissolution of Exposed Resist Films

Hsiao‐Yi Shih, Arnost Reiser · Macromolecules · 1996 · 16 citations

Engineering, Organic Chemistry, Chemistry +16

Percolation View of Novolak Dissolution. 8. Effect of the Base Cation on Dissolution Rate

Hsiao‐Yi Shih, Arnost Reiser · Macromolecules · 1997 · 11 citations

Novolak Resins, Percolation View, Dissolution Rate +12

1–5 of 5