Concepedia

John Sheil

JS

19

Publications

591

Citations

14

H-Index

2015

Active since

Affiliations

Vrije Universiteit Amsterdam(Current)

Advanced Research Center for Nanolithography (Netherlands)

University of Groningen

University of Twente

Keldysh Institute of Applied Mathematics

John Sheil is an author at Vrije Universiteit Amsterdam specializing in engineering, applied physics, and physics.

ORCID

Top concepts

Publications per year

2015–2024

19

Publications

19

Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Francesco Torretti, John Sheil, Ruben Schupp et al. · Nature Communications · 2020 · 115 citations · Full text

Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser

L. Behnke, Ruben Schupp, Zoi Bouza et al. · Optics Express · 2020 · 69 citations · Full text

Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)

O. O. Versolato, John Sheil, Stefan Witte et al. · Journal of Optics · 2022 · 61 citations · Full text

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Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma

Ruben Schupp, Francesco Torretti, Randy A. Meijer et al. · Applied Physics Letters · 2019 · 37 citations · Full text

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Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets

Ruben Schupp, L. Behnke, Zoi Bouza et al. · Journal of Physics D Applied Physics · 2021 · 35 citations · Full text

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