Statistics
Publications
23
Citations
2K
H-Index
20
Active since
2004
K. Xiong is an author at University of Cambridge specializing in engineering, applied physics, and physics.
Publications per year
2004–2024
23
23
Defect energy levels in HfO2 high-dielectric-constant gate oxide
K. Xiong, John Robertson, Michael C. Gibson et al. · Applied Physics Letters · 2005 · 503 citations · Full text
Band gaps and defect levels in functional oxides
John Robertson, K. Xiong, Stewart J. Clark · Thin Solid Films · 2005 · 180 citations
Passivation of oxygen vacancy states in HfO2 by nitrogen
K. Xiong, John Robertson, Stewart J. Clark · Journal of Applied Physics · 2006 · 154 citations · Full text
1–5 of 23