Mark R. Kozlowski

Subsurface damage and polishing compound affect the 355-nm laser damage threshold of fused silica surfaces

D.W. Camp, Mark R. Kozlowski, Lynn M. Sheehan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 123 citations

Engineering, Materials Engineering, Materials Science +17

Reactive evaporation of low-defect density hafnia

Robert H. Chow, S. Falabella, Gary E. Loomis et al. · Applied Optics · 1993 · 111 citations

Engineering, Materials Engineering, Materials Science +15

Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface

Mark R. Kozlowski, P. S. Tyler, William H. Smyrl et al. · Surface Science · 1988 · 85 citations

Natural Sciences, Materials Engineering, Materials Science +16

Growth of laser-initiated damage in fused silica at 351 nm

Mary A. Norton, Lawrence W. Hrubesh, Zhouling Wu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 80 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +11

Rear-surface laser damage on 355-nm silica optics owing to Fresnel diffraction on front-surface contamination particles

François Y. Génin, Michael D. Feit, Mark R. Kozlowski et al. · Applied Optics · 2000 · 80 citations

Natural Sciences, Materials Engineering, Materials Science +16