Hot-Wire Chemical Vapor Deposition of Chalcogenide Materials for Phase Change Memory Applications

A. Abrutis, Valentina Plaušinaitienė, Martynas Skapas, +7

Chemistry of Materials

EngineeringChemical DepositionPhase Change MemoryHot-wire CvdChemical Engineering +14

Chemical Vapor Deposition of TBC: An Alternative Process for Gas Turbine Components

G. Wahl, W. Nemetz, Massimo Giannozzi, +5

Journal of Engineering for Gas Turbines and Power

EngineeringGas Turbine CombustionChemical DepositionChemical EngineeringCorrosion +15

Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD

Dirk J. Hagen, J.P. Connolly, Ian M. Povey, +2

Advanced Materials Interfaces

Materials ScienceEpitaxial GrowthCopper Oxide MaterialsEngineeringIsland Coalescence +13

Chemical vapor deposition of chalcogenide materials for phase-change memories

A. Abrutis, Valentina Plaušinaitienė, Martynas Skapas, +7

Microelectronic Engineering

Materials ScienceEngineeringElectronic MemoryApplied PhysicsCondensed Matter Physics +4

Titanium Phosphide Coatings from the Atmospheric Pressure Chemical Vapor Deposition of TiCl₄ and RPH₂ (R = <i>t</i>-Bu, Ph, Cy^H^ex)

Christopher S. Blackman, Claire J. Carmalt, Ivan P. Parkin, +4

Chemistry of Materials

Materials EngineeringMaterials ScienceChemical EngineeringHexagonal CellEngineering +13

Plasma enhanced atomic layer deposition of copper: A comparison of precursors

Dirk J. Hagen, J.P. Connolly, Roger Nagle, +5

Surface and Coatings Technology

Materials ScienceEngineeringCorrosionSurface ScienceApplied Physics +6

Growth study of GexSbyTez deposited by MOCVD under nitrogen for non-volatile memory applications

Massimo Longo, O. Salicio, Claudia Wiemer, +8

Journal of Crystal Growth

Materials ScienceMaterials EngineeringIi-vi SemiconductorEngineeringCrystal Growth Technology +5

Atomic layer deposition of Cu with a carbene-stabilized Cu(<scp>i</scp>) silylamide

Dirk J. Hagen, Ian M. Povey, S. Rushworth, +7

Journal of Materials Chemistry C

Materials ScienceMetal–organic CuEngineeringNanotechnologyMolecular Hydrogen +7

Microstructure and properties of aluminum contacts formed on GaAs(100) by low pressure chemical vapor deposition with dimethylethylamine alane source

V. I. Shashkin, S. Rushworth, V. M. Danil’tsev, +4

Journal of Electronic Materials

Materials ScienceAluminium NitrideAluminum ContactsEngineeringSurface Science +7

Hot-wire chemical vapor growth and characterization of crystalline GeTe films

A. Abrutis, Valentina Plaušinaitienė, Martynas Skapas, +3

Journal of Crystal Growth

Materials ScienceEngineeringCrystal Growth TechnologyApplied PhysicsCrystalline Gete Films +4