R. Görtzen

High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells

Florian Werner, W. T. M. Stals, R. Görtzen et al. · Energy Procedia · 2011 · 74 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Spatially-separated atomic layer deposition of Al<inf>2</inf>O<inf>3</inf>, a new option for high-throughput si solar cell passivation

Bart Vermang, Florian Werner, W. T. M. Stals et al. · 2011 · 24 citations

Engineering, Materials Engineering, Materials Science +17

Large-Area n-Type PERT Solar Cells Featuring Rear p⁺Emitter Passivated by ALD Al₂O₃

Emanuele Cornagliotti, A. Urueña, Monica Alemán et al. · IEEE Journal of Photovoltaics · 2015 · 17 citations

Engineering, Materials Engineering, Materials Science +11

Resistive Intrinsic ZnO Films Deposited by Ultrafast Spatial ALD for PV Applications

Naomi Nandakumar, B. Dielissen, Diana Garcia‐Alonso et al. · IEEE Journal of Photovoltaics · 2015 · 16 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Thermal Stability of Spatial ALD Deposited Al2O3 Capped by PECVD SiNx for the Passivation of Lowly- and Highly-Doped p-Type Silicon Surfaces

F.M.M. Souren, D. Schuldis, R. Görtzen et al. · Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) · 2012 · 16 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17