Concepedia

Kuniyuki Kakushima

KK

125

Publications

3.1K

Citations

31

H-Index

2003

Active since

Affiliations

Tokyo Institute of Technology(Current)

The University of Tokyo

City University of Hong Kong

University of Tsukuba

Hodges University

Kuniyuki Kakushima is an author at Tokyo Institute of Technology specializing in applied physics, engineering, and electrical engineering.

Top concepts

EngineeringApplied PhysicsElectrical EngineeringMaterial ScienceMicroelectronicsNanoelectronicsSurface ScienceThin FilmsSemiconductorsMaterials Engineering

Publications per year

2003–2024

125

Publications

125

X-ray photoelectron spectroscopy study of high-k CeO2/La2O3 stacked dielectrics

Jieqiong Zhang, Hei Wong, Danqun Yu et al. · AIP Advances · 2014 · 87 citations · Full text

Materials Science, Materials Engineering, Chemical Engineering +13

Room-temperature deposition of a poling-free ferroelectric AlScN film by reactive sputtering

Sung-Lin Tsai, Takuya Hoshii, Hitoshi Wakabayashi et al. · Applied Physics Letters · 2021 · 85 citations

Materials Science, Materials Engineering, Electrical Engineering +15

DNA Manipulation and Retrieval from an Aqueous Solution with Micromachined Nanotweezers

Gen Hashiguchi, Takushi Goda, Maho Hosogi et al. · Analytical Chemistry · 2003 · 74 citations

Suppression of oxygen vacancy formation in Hf-based high-k dielectrics by lanthanum incorporation

Naoto Umezawa, Kenji Shiraishi, Seiichi Sugino et al. · Applied Physics Letters · 2007 · 71 citations · Full text

Dielectrics, Engineering, Hf-based High-k Dielectrics +16

Multi-layered MoS<sub>2</sub> film formed by high-temperature sputtering for enhancement-mode nMOSFETs

T. Ohashi, Kohei Suda, Seiya Ishihara et al. · Japanese Journal of Applied Physics · 2015 · 70 citations

Engineering, Thin Film Process Technology, Chemical Deposition +20

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