Ian R. Oliver

EUV discharge light source based on a dense plasma focus operated with positive and negative polarity

Igor V. Fomenkov, N. Böwering, C. L. Rettig et al. · Journal of Physics D Applied Physics · 2004 · 48 citations

Pinch Discharge, Electrical Engineering, Dense Plasma Focus +13

<title>Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor</title>

William N. Partlo, Igor V. Fomenkov, Ian R. Oliver et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 26 citations

Engineering, Energy Efficiency, Energy Conversion +18

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor V. Fomenkov, Richard Ness, Ian R. Oliver et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 23 citations

<title>Progress toward use of a dense plamsa focus as a light source for production EUV lithography</title>

William N. Partlo, Igor V. Fomenkov, Richard Ness et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 14 citations

Engineering, Electron-beam Lithography, Microscopy +19

Optimization of a dense plasma focus device as a light source for EUV lithography

Igor V. Fomenkov, William N. Partlo, Richard Ness et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 13 citations

Electrical Engineering, Parameter Space, Engineering +13