Statistics
Publications
4
Citations
51
H-Index
4
Active since
2006
Affiliations
Philips (Germany)(Current)
Max C. Schürmann is an author at Philips (Germany) specializing in optoelectronics, plasma physics, and photonics.
Publications per year
2006–2011
4
4
Marc Corthout, R. Apetz, J. Brudermann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 16 citations
Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools
Uwe Stamm, J. Kleinschmidt, D. Bolshukhin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 13 citations
Engineering, Manufacturing Engineering, Nuclear Engineering +9
Tin DPP source collector module (SoCoMo) ready for integration into Beta scanner
Masaki Yoshioka, Yusuke Teramoto, Jeroen Jonkers et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 12 citations
Engineering, Manufacturing Engineering, Materials Science +11
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