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1
Citations
20
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1
Active since
2000
Affiliations
Los Alamos National Laboratory(Current)
John M. Veilleux is an author at Los Alamos National Laboratory specializing in applied physics, materials science, and engineering.
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2000–2000
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Etching of UO2 in NF3 RF plasma glow discharge
John M. Veilleux, Mohamed S. El‐Genk, E. P. Chamberlin et al. · Journal of Nuclear Materials · 2000 · 20 citations
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