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Low voltage operating InGaZnO4 thin film transistors using high-k MgO–Ba0.6Sr0.4TiO3 composite gate dielectric on plastic substrate
43
Citations
13
References
2008
Year
Materials ScienceMaterials EngineeringElectrical EngineeringPlastic SubstrateRoom TemperatureEngineeringLow VoltageOxide ElectronicsApplied PhysicsIngazno4 TftsSemiconductor Device FabricationThin Film Process TechnologyThin FilmsMicroelectronicsSemiconductor Device
The authors report on the dielectric and leakage current properties of room temperature grown MgO-Ba0.6Sr0.4TiO3 (MgO-BST) composite thin films to be utilized InGaZnO4 thin films transistors (TFTs) fabricated on a polyethylene terephthalate (PET) substrate. The InGaZnO4 TFTs with MgO-BST gate dielectrics exhibited low operation voltage of 4V, high on/off current ratio of 4.13×106, and high field effect mobility of 10.86cm2∕Vs. These results verify that a room temperature grown MgO-BST gate dielectric is a good candidate for producing high performance InGaZnO4 TFTs on plastic substrates.
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