Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping - Concepedia

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Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping

19

Citations

55

References

2024

Year

Zhenyu Zhang, Ning Wang, Xingzi Wang, Zheng Zhao, Dong Chen, Xianmin Tan, Yuanyuan Zheng, Zongyu Feng, Xiangxi Zhong, Juanyu Yang,

Applied Surface Science

Materials ScienceMaterials EngineeringChemical EngineeringMaterial AnalysisEngineeringNanoporous MaterialOxide ElectronicsSurface ScienceChemistrySurface ProcessingCermet

References

	Year	Citations

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