A high-performance TiO₂ protective layer derived from non-high vacuum technology for a Si-based photocathode to enhance photoelectrochemical water splitting

Abstract

A non-high vacuum technique was used to fabricate a TiO 2 protective layer of a Si-based photocathode, in which MOF derivatives enhance carrier transfer efficiency. The photocathode has high onset potential, high photocurrent and long-term stability.