Publication | Closed Access
Achieving excellent ferroelectric and dielectric performance of HfO2/ZrO2/HfO2 thin films under low operating voltage
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Citations
38
References
2023
Year
Materials ScienceFerroelasticsDielectric PerformanceEngineeringFerroelectric ApplicationOxide ElectronicsApplied PhysicsLow Operating VoltageHfo2/zro2/hfo2 Thin FilmsThin FilmsElectrical Insulation
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