Publication | Open Access
Exceptional high temperature retention in Al0.93B0.07N films
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Citations
25
References
2023
Year
Materials EngineeringMaterials ScienceAluminium NitrideEngineeringFerroelectric ApplicationData RetentionOxide ElectronicsApplied PhysicsRetention BehaviorFerroelectric MaterialsThin Film Process TechnologyThin FilmsAl0.93b0.07n Thin FilmsAl0.93b0.07n FilmsThin Film Processing
This paper reports the retention behavior for Al0.93B0.07N thin films, a member of the novel family of wurtzite ferroelectrics. Our experiments suggest that bipolar cycling of metal (Pt/W)/Al0.93B0.07N/W/Al2O3 film stacks first induced wake-up and then a region of constant switchable polarization. The films showed excellent retention of the stored polarization state. As expected, data retention was slightly inferior in the opposite state (OS) measurements. However, it is noted that even after 3.6 × 106 s (1000 h) at 200 °C, the OS signal margin still exceeded 200 μC/cm2. The predicted OS retention is 82% after 10 yr baking at 200 °C.
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