Publication | Open Access
Designing interstitial boron‐doped tunnel‐type vanadium dioxide cathode for enhancing zinc ion storage capability
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Citations
50
References
2023
Year
Materials ScienceEngineeringBattery Electrode MaterialsAbstract Chemical DopingOxide ElectronicsAdvanced Electrode MaterialApplied PhysicsInterstitial BoronEnergy StorageElectrochemical Energy StorageBatteriesChemistryElectrochemistryBoron Resides
Abstract Chemical doping is a powerful method to intrinsically tailor the electrochemical properties of electrode materials. Here, an interstitial boron‐doped tunnel‐type VO 2 (B) is constructed via a facile hydrothermal method. Various analysis techniques demonstrate that boron resides in the interstitial site of VO 2 (B) and such interstitial doping can boost the zinc storage kinetics and structural stability of VO 2 (B) cathode during cycling. Interestingly, we found that the boron doping level has a saturation limit peculiarity as proved by the quantitative analysis. Notably, the 2 at.% boron‐doped VO 2 (B) shows enhanced zinc ion storage performance with a high storage capacity of 281.7 mAh g −1 at 0.1 A g −1 , excellent rate performance of 142.2 mAh g −1 at 20 A g −1 , and long cycle stability up to 1000 cycles with the capacity retention of 133.3 mAh g −1 at 5 A g −1 . Additionally, the successful preparation of the boron‐doped tunnel‐type α‐MnO 2 further indicates that the interstitial boron doping approach is a general strategy, which supplies a new chance to design other types of functional electrode materials for multivalence batteries.
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