Publication | Closed Access

Utilization of conventional PXRD apparatus for characterization of thin-films using reconsidered equations for XRR

Materials ScienceMaterials EngineeringMaterial AnalysisEngineeringSurface ScienceApplied PhysicsReconsidered EquationsX-ray DiffractionThin Film Process TechnologyThin FilmsConventional Pxrd ApparatusDepth-graded Multilayer CoatingThin Film Processing