Facilitating Uniform Large-Scale MoS₂, WS₂ Monolayers, and Their Heterostructures through van der Waals Epitaxy

Abstract

The fabrication process for the uniform large-scale MoS₂, WS₂ transition-metal dichalcogenides (TMDCs) monolayers, and their heterostructures has been developed by van der Waals epitaxy (VdWE) through the reaction of MoCl₅ or WCl₆ precursors and the reactive gas H₂S to form MoS₂ or WS₂ monolayers, respectively. The heterostructures of MoS₂/WS₂ or WS₂/MoS₂ can be easily achieved by changing the precursor from WCl₆ to MoCl₅ once the WS₂ monolayer has been fabricated or switching the precursor from MoCl₅ to WCl₆ after the MoS₂ monolayer has been deposited on the substrate. These VdWE-grown MoS₂, WS₂ monolayers, and their heterostructures have been successfully deposited on Si wafers with 300 nm SiO₂ coating (300 nm SiO₂/Si), quartz glass, fused silica, and sapphire substrates using the protocol that we have developed. We have characterized these TMDCs materials with a range of tools/techniques including scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), micro-Raman analysis, photoluminescence (PL), atomic force microscopy (AFM), transmission electron microscopy (TEM), energy-dispersive X-ray spectroscopy (EDX), and selected-area electron diffraction (SAED). The band alignment and large-scale uniformity of MoS₂/WS₂ heterostructures have also been evaluated with PL spectroscopy. This process and resulting large-scale MoS₂, WS₂ monolayers, and their heterostructures have demonstrated promising solutions for the applications in next-generation nanoelectronics, nanophotonics, and quantum technology.