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Effect of vacuum annealing and position of metal Cu on structural, optical, electrical and thermoelectrical properties of ITO/Cu/ITO multilayers prepared by RF sputtering

Materials EngineeringMaterials ScienceThermoelectrical PropertiesEngineeringPhysicsIto/cu/ito MultilayersNanoelectronicsNanotechnologySurface ScienceApplied PhysicsMetallic Functional MaterialSemiconductor MaterialMetal CuMicroelectronicsThin Film Processing