Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution

Abstract

A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of <i>Pyrus communis</i> L. by 35-44%, and the diameter of the root collar by 10-28%. In this case, the electrical resistivity of the graft decreased by 20-48%, which indicated the formation of a more developed vascular system at the rootstock-scion interface. The characteristics of DBD CAP and PTS are described in detail.