Analyses of interface adhesion between porous SiOCH low-k film and SiCN layers by nanoindentation and nanoscratch tests - Concepedia

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Analyses of interface adhesion between porous SiOCH low-k film and SiCN layers by nanoindentation and nanoscratch tests

33

Citations

19

References

2007

Year

Shou-Yi Chang, Hung-Chun Tsai, Jien-Yi Chang, Su-Jien Lin, Yee-Shyi Chang

Thin Solid Films

Materials ScienceInterface AdhesionEngineeringNanoelectronicsSurface ScienceApplied PhysicsNanoscratch TestsChemical Vapor DepositionThin Film ProcessingSicn Layers

References

	Year	Citations

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