Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonate

Abstract

Amorphous aluminum oxide thin films were prepared on glass and silicon (100) substrates by a low-temperature atmospheric-pressure chemical vapor deposition method. The raw material was aluminum acetylacetonate, which is nontoxic and easy to handle. The substrate temperature could be lowered to 250 °C by the thermal decomposition of aluminum acetylacetonate in air.