Niobium Oxide Electrochromic Thin Films Prepared by Reactive DC Magnetron Sputtering

Abstract

Niobium oxide electrochromic thin films were prepared by reactive DC magnetron sputtering method. Electrochromic properties of prepared films strongly depended on the substrate temperature during sputtering. The sample with a substrate temperature of 500° C was well crystallized and showed excellent electrochromism. Its integrated luminous transmittance could be controlled from 26% to 89%. Optical modulation range was small for samples with low substrate temperature and these samples showed fast degradation.