Publication | Closed Access
Controllable p-type doping of monolayer MoS<sub>2</sub>with tantalum by one-step chemical vapor deposition
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Citations
55
References
2022
Year
Oxide HeterostructuresSystematic Characterization StudiesIi-vi SemiconductorTransition Metal ChalcogenidesEngineeringLayered MaterialControllable P-type DopingControllable PureOxide ElectronicsOxide SemiconductorsApplied PhysicsSurface ScienceSemiconductor MaterialChemistryThin FilmsChemical DepositionChemical Vapor Deposition
The synthesis of controllable pure and p-type in situ Ta-doped monolayer MoS 2 with different doping concentrations via a one-step salt-assisted chemical vapor deposition (CVD) method with systematic characterization studies is reported.
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