Publication | Open Access
Large enhancement of ferroelectric polarization in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> films by low plasma energy pulsed laser deposition
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Citations
35
References
2021
Year
Materials ScienceLarge EnhancementMultiferroicsLow Plasma EnergyEngineeringFerroelectric ApplicationApplied PhysicsMixed ArFerroelectric MaterialsFerroelectric PolarizationThin FilmsPulsed Laser DepositionPyroelectricityConventional PldPld Plasma Energy
PLD of ferroelectric HfO 2 done under a mixed Ar and O 2 atmosphere allows the reduction of the PLD plasma energy, resulting in fewer defects and an increase of the ferroelectric polarization of around 50% compared to films grown by conventional PLD.
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