REVIEW OF PHYSICAL VAPOUR DEPOSITION (PVD) TECHNIQUES FOR HARD COATING

M. Mubarak Ali, Esah Hamzah, Mohd Radzi Mohd Toff

2005 · 36 citations · 34 references

Concepts

TL;DR

PVD hard coatings, especially sputtering and cathodic arc methods, are widely applied to cutting tools to reduce costs and boost productivity, though each technique has distinct limitations and parameter sensitivities. This review examines the status of hard coatings produced by various PVD techniques and compares their properties. The authors evaluate CAE and conventional magnetron sputtering, discuss their drawbacks and improvements, and describe modifications that yield uniform, dense coatings with better adhesion and reduced macrodroplet emission. The review concludes that CAE and RF magnetron sputtering are the most widely used and suitable techniques for thin‑film hard‑coating applications.

Abstract

This paper is a review on the status of hard coating of various physical vapour deposition (PVD) techniques and compare their properties. The use of hard and wear resistant PVD coatings on cutting tools is now widespread in global manufacturing for reducing production cost and improving productivity, all of which are essential if industry is to remain economically competitive. The review includes the drawbacks of cathodic arc evaporation (CAE) and conventional magnetron sputtering processes and in this context their improvements. PVD techniques based on sputtering and cathodic arc methods are widely used to deposit hard coating for various cutting tools and many others. From the study, it was concluded that the CAE and radio frequency (RF) magnetron sputtering are the most widely used techniques and appropriate methods for thin film coating. Each technique has its own limitations and process parameters vary with the selection of PVD techniques. These techniques were further modified where uniform and dense coatings with improved adhesion can be achieved without the emission of macrodroplets from plasma streams

References

34