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THE MOBILITY OF THE SURFACE ATOMS OF COPPER AND SILVER EVAPORATED DEPOSITS
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1966
Year
Unknown Venue
EngineeringChemistryChemical DepositionSurface Self-diffusion CoefficientsThin Film ProcessingMaterials ScienceMaterials EngineeringPhysicsNanotechnologyChemical Vapor DepositionElemental MetalMicrostructureDiffusion ResistanceSurface ChemistryNatural SciencesSurface ScienceApplied PhysicsThin FilmsStep SmoothingSurface Reactivity
Abstract : Estimates of the surface self-diffusion coefficients of evaporated deposits were made from (1) the spread of material into a shadow cast by the placing of an object between source and substrate, (2) the decay on annealing of the step produced in a metal film deposited onto a mica surface with a cleavage step, (3) the thermal grooving of grain boundaries in deposited films, and (4) the growth of holes in thin films. Rate laws were proposed and verified experimentally for step smoothing and the growth of holes.