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Enhancement of discharge and deposition rate by imposed pulse current during the cathodic arc deposition of ta-C films

Cathodic Arc DepositionElectrical EngineeringEngineeringGlow DischargeApplied PhysicsTa-c FilmsDeposition RatePulse PowerChemical DepositionPulsed Laser DepositionGas Discharge PlasmaChemical Vapor DepositionElectrical Insulation