Publication | Open Access
Thickness effect on the ferroelectric properties of La-doped HfO<sub>2</sub> epitaxial films down to 4.5 nm
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Citations
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References
2021
Year
Materials ScienceMultiferroicsHigh Remanent PolarizationSame Poling VoltageEngineeringPhysicsEpitaxial GrowthOxide ElectronicsFerroelectric ApplicationApplied PhysicsCondensed Matter PhysicsEpitaxial LaThin FilmsFerroelectric PropertiesMolecular Beam EpitaxyThickness Effect
Epitaxial La:HfO 2 films of less than 7 nm have a high remanent polarization of about 30 μC cm −2 , and show slight wake-up, endurance of at least 10 10 cycles and retention of more than 10 years, with both latter properties measured at the same poling voltage.
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