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Significant improvement of ferroelectricity and reliability in Hf0.5Zr0.5O2 films by inserting an ultrathin Al2O3 buffer layer
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Citations
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References
2020
Year
Materials ScienceMaterials EngineeringElectrical EngineeringMaterial AnalysisEngineeringFerroelasticsFerroelectric ApplicationCorrosionOxide ElectronicsApplied PhysicsSignificant ImprovementThin FilmsFunctional MaterialsHf0.5zr0.5o2 Films
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