Influence of high dielectric HfO2 thin films on the electrical properties of Al/HfO2/n-Si (MIS) structured Schottky barrier diodes - Concepedia

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Influence of high dielectric HfO2 thin films on the electrical properties of Al/HfO2/n-Si (MIS) structured Schottky barrier diodes

36

Citations

47

References

2020

Year

P. Harishsenthil, J. Chandrasekaran, R. Marnadu, P. Balraju, C. Mahendran

Physica B Condensed Matter

Materials ScienceElectrical EngineeringEngineeringApplied PhysicsSemiconductor MaterialSchottky Barrier DiodesThin FilmsMicroelectronicsElectrical PropertiesOptoelectronicsSemiconductor Device

References

	Year	Citations

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