Publication | Closed Access
Improved dielectric properties of La2O3–ZrO2 bilayer films for novel gate dielectrics
16
Citations
29
References
2020
Year
Materials ScienceOxide HeterostructuresElectrical EngineeringMaterials EngineeringDielectric PropertiesEngineeringFerroelectric ApplicationOxide ElectronicsApplied PhysicsLa2o3–zro2 Bilayer FilmsNovel Gate DielectricsThin Film Process TechnologyThin FilmsFunctional MaterialsThin Film Processing
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