The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering - Concepedia

Concepedia

Publication | Open Access

The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering

DOI Full Paper Access

28

Citations

27

References

2020

Year

Nils Nedfors, Daniel Primetzhofer, Igor Zhirkov, Justinas Pališaitis, Per O. Å. Persson, J. E. Greene, I. Petrov, Johanna Rosén

Materials ScienceMagnetismMaterials EngineeringEpitaxial GrowthEngineeringNanoelectronicsApplied PhysicsDc MagnetronMagnetic Thin FilmsThin FilmsChemical DepositionMagnetic FieldChemical Vapor DepositionThin Film Processing

References

	Year	Citations

Page 1

Page 1