Characteristics of the Te-based chalcogenide films dependently on the parameters of the PECVD process - Concepedia

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Characteristics of the Te-based chalcogenide films dependently on the parameters of the PECVD process

26

Citations

31

References

2020

Year

Leonid Mochalov, Alexander Logunov, Anna Kitnis

Optical and Quantum Electronics

Materials EngineeringMaterials ScienceEpitaxial GrowthIi-vi SemiconductorEngineeringApplied PhysicsPecvd ProcessThin FilmsTe-based Chalcogenide FilmsChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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