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Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringOptoelectronic PropertiesApplied PhysicsDirect Current MagnetronSemiconductor MaterialPulsed Laser DepositionOptoelectronicsThin Film ProcessingP-type Nio Films