Multicompartment Microparticles with Patchy Topography through Solvent-Adsorption Annealing

Abstract

We report on the evaporation-induced confinement assembly (EICA) of polystyrene-<i>b-</i>polybutadiene-<i>b</i>-poly(methyl methacrylate) (PS-<i>b</i>-PB-<i>b</i>-PMMA, SBM) triblock terpolymers into multicompartment microparticles and follow their morphological evolution during solvent-adsorption annealing. We initially obtain elliptic microparticles with axially stacked PS/PB/PMMA morphology using cetyltrimethylammonium bromide (CTAB) as surfactant. Exchanging the surfactant to poly(vinyl alcohol) (PVA) during solvent vapor annealing with chloroform (CHCl₃), PMMA preferentially interacts with the interface, and microparticles change their shape into spheres with concentric morphology. Surprisingly, this transformation initiates at both poles of the microparticles simultaneously and then proceeds toward the equator, resulting in particles with inner morphology and patchy topography. We observed this evolution for different PB fractions, suggesting the mechanism to be more general and the EICA process to be a suitable method to generate patchy particle surfaces.