Highly selective atomic layer deposition of MoSiOx using inherently substrate-dependent processes - Concepedia

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Highly selective atomic layer deposition of MoSiOx using inherently substrate-dependent processes

13

Citations

17

References

2019

Year

Jong Youn Choi, Christopher F. Ahles, Keith T. Wong, Srinivas Nemani, Ellie Yieh, Andrew C. Kummel

Applied Surface Science

Substrate-dependent ProcessesMaterials ScienceEngineeringNanotechnologySurface ScienceApplied PhysicsMolecular Beam EpitaxyChemical DepositionEpitaxial GrowthChemical Vapor Deposition

References

	Year	Citations

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