Concepedia

Publication | Open Access

Displacement Talbot lithography for nano-engineering of III-nitride materials

DOIFull Paper Access

45

Citations

66

References

2019

Year

Pierre‐Marie Coulon, B. Damilano, Blandine Alloing, Pierre Chausse, Sebastian Walde, Johannes Enslin, R. L. Armstrong, S. Vézian, Sylvia Hagedorn, Tim Wernicke,
Microsystems & Nanoengineering

References

YearCitations

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