Degradation and regeneration mechanisms of NiO protective layers deposited by ALD on photoanodes

Carles Ros, Teresa Andreu, Jérémy David, Jordi Arbiol, J.R. Morante

Journal of Materials Chemistry A · 2019 · 24 citations · 64 references

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Abstract

The degradation mechanisms of ALD-grown NiO protective layers over 1000 h under anodic alkaline conditions are identified and a recovery mechanism is presented.

References

64