Publication | Closed Access

Contribution of enhanced ionization to the optoelectronic properties of p-type NiO films deposited by high power impulse magnetron sputtering

Materials ScienceElectrical EngineeringOptical MaterialsEnhanced IonizationEngineeringNanoelectronicsOptoelectronic PropertiesApplied PhysicsThin FilmsPulsed Laser DepositionPyroelectricityIon EmissionOptoelectronicsP-type Nio Films