Effects of carbon concentration on high-hardness plasma-polymer-fluorocarbon film deposited by mid-range frequency sputtering

Abstract

Abstract We propose a method for fabricating high-hardness plasma-polymer-fluorocarbon (PPFC) thin films with controllable optical and surface properties via manipulation of the target composition design and sputtering power density. The carbon/polytetrafluoroethylene (PTFE) composite polymeric material targets with the low electrical resistance were prepared by press-molding using a mechanically mixed powder of PTFE, carbon nanotubes, and graphite. The composite targets showed electrical sheet resistances of 0.1–100 Ω/sq. PPFC thin films were deposited by mid-range frequency (MF) sputtering at power densities within 0.62~4.92 W/cm 2 . The maximum surface hardness of the PPFC thin film was 4.75 GPa, which was 21.6 times higher than that of fluorocarbon thin film sputtered from PTFE under the same conditions. With the increase of the carbon concentration in the target, the carbon cross-linking density of the PPFC thin film increased but the fluorine concentration decreased. The concentration of fluorine in the PPFC thin films grew with increasing sputtering power density. The MF sputtered carbon-rich PPFC thin films are controllable with physical properties of optical transmittance, surface hardness and surface water repellency which could be applied as protective layers for transparent flexible devices.