The Journal of Physical Chemistry C · 2014 · 285 citations · 32 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsElectronic MaterialsSemiconductor MaterialsDefects In Electronic MaterialsElectronic Band StructureMetal OxidesOptical Properties Of SolidsOxide SemiconductorsSemiconductor DefectsBand Structure CalculationCrystal Defects In OxidesOptical PropertiesOxide Defect StatesPhotoluminescence SpectroscopyPlasma Exposure EffectsPlasma TreatmentQuenching
By creating defects via oxygen plasma treatment, we demonstrate optical properties variation of single-layer MoS 2 . We found that, with increasing plasma exposure time, the photoluminescence (PL) evolves from very high intensity to complete quenching, accompanied by gradual reduction and broadening of MoS 2 Raman modes, indicative of distortion of the MoS 2 lattice after oxygen bombardment. X-ray photoelectron spectroscopy study shows the appearance of the Mo 6+ peak, suggesting the creation of MoO 3 disordered regions in the MoS 2 flake. Finally, using band structure calculations, we demonstrate that the creation of MoO 3 disordered domains upon exposure to oxygen plasma leads to a direct-to-indirect bandgap transition in single-layer MoS 2, which explains the observed PL quenching.
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