Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering - Concepedia

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Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering

DOI Full Paper Access

28

Citations

43

References

2019

Year

Benjamin V.T. Hanby, Bryan W. Stuart, Miquel Gimeno-Fabra, Jonathan Moffat, Chris Gerada, David M. Grant

Applied Surface Science

References

	Year	Citations

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