Publication | Open Access
Chemical vapor deposition of titanium nitride thin films: kinetics and experiments
31
Citations
30
References
2019
Year
Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSurface ScienceApplied PhysicsTitanium NitrideThin Film Process TechnologyTin LayerThin FilmsPulsed Laser DepositionChemical DepositionChemical Vapor DepositionChemical VaporThin Film Processing
Titanium nitride (TiN) films were grown by chemical vapor deposition (CVD) from titanium chlorides, ammonia (NH<sub>3</sub>) and hydrogen (H<sub>2</sub>) on single crystal <italic>c</italic>-plane sapphire, WC–Co, stainless steel and amorphous graphite substrates. The preferred orientation and color of TiN layer are studied by combining a simplified kinetic model with experiments.
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