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Molecularly imprinted Ag/Ag3VO4/g-C3N4 Z-scheme photocatalysts for enhanced preferential removal of tetracycline

Inorganic ChemistryChemical EngineeringEngineeringPhotoredox ProcessPhotochemistryInorganic PhotochemistrySynthetic PhotochemistryOrganic ChemistryPhotocatalysisEnhanced Preferential RemovalCatalysisClick ChemistryChemistryAg/ag3vo4/g-c3n4 Z-scheme Photocatalysts