Publication | Closed Access

Parametric study and residual gas analysis of large-area silicon-nitride thin-film deposition by plasma-enhanced chemical vapor deposition

Materials EngineeringEngineeringNanoelectronicsSurface ScienceApplied PhysicsParametric StudyChemical DepositionChemical Vapor DepositionMicroelectronicsPlasma ProcessingResidual Gas AnalysisThin Film Processing