Publication | Open Access
Cu:NiO as a hole-selective back contact to improve the photoelectrochemical performance of CuBi<sub>2</sub>O<sub>4</sub> thin film photocathodes
110
Citations
46
References
2019
Year
Materials ScienceCopper Oxide MaterialsFto SubstratesEngineeringPhotochemistryPhotoelectrochemical PerformanceOxide ElectronicsSurface ScienceApplied PhysicsHole-selective Back ContactPhoto-electrochemical CellOptoelectronic DevicesPhotoelectric MeasurementChemistryThin FilmsThin Film Process TechnologyPhotoelectrochemistryContact Layers
Cu doped NiO (Cu:NiO) back contact layers are inserted between FTO substrates and CuBi<sub>2</sub>O<sub>4</sub> thin films to improve the performance of CuBi<sub>2</sub>O<sub>4</sub> photocathodes.
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