Direct cell imprint lithography in superconductive carbon black polymer composites: process optimization, characterization and <i>in vitro</i> toxicity analysis

Abstract

Cell imprint lithography (CIL) or cell replication plays a vital role in fields like biomimetic smart&#13;\nculture substrates, bone tissue engineering, cell guiding, cell adhesion, tissue engineering, cell&#13;\nmicroenvironments, tissue microenvironments, cell research, drug delivery, diagnostics, therapeutics&#13;\nand many other applications. Herein we report a new formulation of superconductive carbon black&#13;\nphotopolymer composite and its characterization towards a CIL process technique. In this article, we&#13;\ndemonstrated an approach of using a carbon nanoparticle-polymer composite (CPC) for patterning&#13;\ncells. It is observed that a 0.3 wt % load of carbon nanoparticles (CNPs) in a carbon polymer mixture&#13;\n(CPM) was optimal for cell-imprint replica fabrication. The electrical resistance of the 3-CPC (0.3 wt %)&#13;\nwas reduced by 68% when compared to N-CPC (0 wt %). This method successfully replicated the&#13;\nsingle cell with sub-organelle scale. The shape of microvesicles, grooves, pores, blebs or microvilli&#13;\non the cellular surface was patterned clearly. This technique delivers a free-standing cell feature&#13;\nsubstrate. In vitro evaluation of the polymer demonstrated it as an ideal candidate for biomimetic&#13;\nbiomaterial applications. This approach also finds its application in study based on morphology,&#13;\nespecially for drug delivery applications and for investigations based on molecular pathways.